Microprocessor controls maintain temperature and humidity in approximate ranges of 35-70°C and 40-95%RH, respectively. An extra large water jacket minimizes condensation inside the chamber and supports optimum uniformity conditions.
A low-pressure water vapor generator, injecting saturated water vapor into the recirculating air duct, controls chamber humidification. This process is preferable to steam generation because steam introduces additional heat to the chamber atmosphere, which then compromises temperature control. Uniform temperature and humidity are maintained using the same horizontal air flow technology employed in the SHEL LAB oven family.
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